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https://doi.org/10.1117/12.148965
Copy DOIPublication Date: Aug 4, 1993 |
Systematic offset errors can be a major contributor to total overlay error on projection wafer steppers. To compensate for this offset error we have developed an automated method using measured overlay results from previous lots to generate offset correction values for current lots. This method provides statistically optimized offset corrections while eliminating the need to process test wafers. In addition the dynamic correction capability of the feedback control loop automatically compensates for offset changes such as drift in stepper alignment systems, process modification, and mask revisions. The system has been in use for over a year and has proven extremely effective in eliminating systematic offset errors on numerous devices.
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