Abstract

We have developed an automatic emissive probe apparatus based on the improved inflection point method of the emissive probe for accurate measurements of both plasma potential and vacuum space potential. The apparatus consists of a computer controlled data acquisition card, a working circuit composed by a biasing unit and a heating unit, as well as an emissive probe. With the set parameters of the probe scanning bias, the probe heating current and the fitting range, the apparatus can automatically execute the improved inflection point method and give the measured result. The validity of the automatic emissive probe apparatus is demonstrated in a test measurement of vacuum potential distribution between two parallel plates, showing an excellent accuracy of 0.1 V. Plasma potential was also measured, exhibiting high efficiency and convenient use of the apparatus for space potential measurements.

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