Abstract
Line patterns produced by lamellae- and cylinder-forming block copolymer (BCP) thin films are of widespread interest for their potential to enable nanoscale patterning over large areas. In order for such patterning methods to effectively integrate with current technologies, the resulting patterns need to have low defect densities, and be produced in a short timescale. To understand whether a given polymer or annealing method might potentially meet such challenges, it is necessary to examine the evolution of defects. Unfortunately, few tools are readily available to researchers, particularly those engaged in the synthesis and design of new polymeric systems with the potential for patterning, to measure defects in such line patterns. To this end, we present an image analysis tool, which we have developed and made available, to measure the characteristics of such patterns in an automated fashion. Additionally we apply the tool to six cylinder-forming polystyrene-block-poly(2-vinylpyridine) polymers thermally annealed to explore the relationship between the size of each polymer and measured characteristics including line period, line-width, defect density, line-edge roughness (LER), line-width roughness (LWR), and correlation length. Finally, we explore the line-edge roughness, line-width roughness, defect density, and correlation length as a function of the image area sampled to determine each in a more rigorous fashion.
Highlights
The ability of block copolymers (BCPs) to self-assemble into periodic structures, with periods ranging from 5 nm to well over 100 nm, has prompted investigation into their potential applications for nanopatterning of integrated circuits,[1,2,3,4] bit-patterned storage media,[4,5,6,7] optical devices,[8,9] tissue interfacing,[10,11,12] and others
To remedy the lack of a readily available and straightforward analytical tool, we developed an accessible and free-to-download application for analyzing the defects in BCP thin films using a combined particle and skeleton based analysis of the pattern, called Automated Defect Analysis of Block Copolymers, or ADAblock for short
No previous work analyzing 2D block copolymer line patterns has brought together data on defects, line-edge roughness (LER), line-width roughness (LWR), and correlation lengths into one application or analysis. We believe that this omission is likely due, in part, to the lack of readily available, widely applicable, easy-to-use tools for analysis, and on occasion, may be a result of selection of the ‘makes-it-look-best metric’, rather than a complete description of pattern quality over larger areas of the sample. We show how such data can ideally be combined to better describe line patterns derived from BCP assembly in thin films
Summary
The ability of block copolymers (BCPs) to self-assemble into periodic structures, with periods ranging from 5 nm to well over 100 nm, has prompted investigation into their potential applications for nanopatterning of integrated circuits,[1,2,3,4] bit-patterned storage media,[4,5,6,7] optical devices,[8,9] tissue interfacing,[10,11,12] and others. Lamellar or cylindrical domains of block copolymers can be used to create linear structures,[13,14] both large[8,15] and small,[16] when confined in one dimension as thin films on substrates with appropriate wetting characteristics. Automated Analysis of Block Copolymer Thin Film Nanopatterns ca) JNM: Izaak Walton Killam Memorial Scholarship, Killam Trusts, 2012-2014 Lamellar or cylindrical domains of block copolymers can be used to create linear structures,[13,14] both large[8,15] and small,[16] when confined in one dimension as thin films on substrates with appropriate wetting characteristics. [17,18,19] Such patterns can be used as lithographic masks through etching or as scaffolds to create other nanostructured surfaces and materials.[20,21]
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