Abstract
Silicon nanonowires (SiNWs) were synthesized with approximately 100 nm/min by very-high-frequency plasma-enhanced chemical vapor deposition method via a vapor–liquid–solid mechanism. Pure silane gas was deposited on Au-coated silicon substrates at various radio frequency (RF) powers varied from 5 to 20 W, keeping other deposition parameters constant. Synthesized SiNWs were needle-like shape with an ultra-sharp tip diameter of about 10 nm and a length about 3 μm, which differs from the standard cylindrical nanowire produced by similar techniques. Furthermore, it was shown that the average length of nanoneedles augmented with the increase of RF power. High-resolution transition electron microscopy displayed that the nanowires were composed of a crystalline Si core with an amorphous oxide shell. Raman spectroscopy also revealed the presence of crystalline Si in the grown Si nanoneedles.
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