Abstract
JM3 Associate Editor Emily Gallagher, a principal researcher at imec, interviews Andreas Erdmann, head of the Fraunhofer IISB Computational Lithography and Optics Group. With Hazem Mesilhy and Peter Evanschitzky, Erdmann is the lead author of “Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?,” a review paper in the April-June 2022 issue of the Journal of Micro/Nanopatterning, Materials, and Metrology.
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