Abstract
First-principles calculations based on density functional theory have been performed to investigate the behaviors of He in hcp-type Ti. The most favorable interstitial site for He is not an ordinary octahedral or tetrahedral site, but a novel interstitial site (called FC) with a formation energy as low as 2.67 eV, locating the center of the face shared by two adjacent octahedrons. The origin was further analyzed by composition of formation energy of interstitial He defects and charge density of defect-free hcp Ti. It has also been found that an interstitial He atom can easily migrate along 〈0 0 1〉 direction with an activation energy of 0.34 eV and be trapped by another interstitial He atom with a high binding energy of 0.66 eV. In addition, the small He clusters with/without Ti vacancy have been compared in details and the formation energies of He n V clusters with a pre-existing Ti vacancy are even higher than those of He n clusters until n ⩾ 3.
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