Atomistic Modeling of Point Defects and Diffusion in Copper Grain Boundaries

Abstract

The atomic structure of several symmetrical tilt grain boundaries (GBs) in Cu and their interaction with vacancies and interstitials as well as self-diffusion are studied by molecular statics, molecular dynamics, kinetic Monte Carlo (KMC), and other atomistic simulation methods. Point defect formation energy in the GBs is on average lower than in the lattice but variations from site to site within the GB core are very significant. The formation energies of vacancies and interstitials are close to one another, which makes the defects equally important for GB diffusion. Vacancies show interesting effects such as delocalization and instability at certain GB sites. They move in GBs by simple vacancy-atom exchanges or by “long jumps” involving several atoms. Interstitial atoms can occupy relatively open positions between atoms, form split dumbbell configurations, or form highly delocalized displacement zones. They diffuse by direct jumps or by the indirect mechanism involving a collective displacement of several atoms. Diffusion coefficients in the GBs have been calculated by KMC simulations using defect jump rates determined within the transition state theory. GB diffusion can be dominated by vacancies or interstitials, depending on the GB structure. The diffusion anisotropy also depends on the GB structure, with diffusion along the tilt axis being either faster or slower than diffusion normal to the tilt axis. In agreement with Borisov's correlation, the activation energy of GB diffusion tends to decrease with the GB energy.