Abstract
A unified technique was developed for chemical atomic-emission analysis of high-purity germanium(IV), molybdenum(VI), tellurium(IV) and tungsten(VI) oxides based on preliminary concentration of nonvolatile impurities by distilling off the matrices after chemical transformations into volatile fluorides by xenon difluoride vapor in an autoclave. The impurity concentrate was analyzed by atomic-emission method with arc and induction discharges. The detection limits of impurities in a gram analytical sample were found to be 10−6–10−8 wt.%.
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