Abstract
A 0.3-nm-high step pattern was formed on a poly(methyl methacrylate) (PMMA) polymer surface by thermal nanoimprinting a sapphire template. Large-area transcription was attained under the condition of ~0.2 MPa load for 300 s at 120 °C. We also observed the thermal deformation of the atomically stepped pattern formed on a PMMA surface by in situ atomic force microscopy at high temperature and found the atomic step pattern was stable near the imprinting temperature of 120 °C and also at about 20 °C higher than the bulk glass transition temperature of PMMA (105 °C).
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