Abstract
ABSTRACTThe geometric structure of GaAs (100) surfaces, treated in a (NH4)2Sx solution and annealed in N2 environment, has been studied in an atomic scale using high-resolution Rutherford backscattering (RBS), X-ray photoemission spectroscopy (XPS) and scanning tunneling microscopy (STM). RBS analysis using medium energy ion scattering (MEIS) could provide the thickness of the sulfur layer on the GaAs surface of about 1.5 monolayers. RBS channeling spectra indicated that the disorder of atoms in the surface region of S-terminated samples was smaller than that of untreated one. XPS spectra showed that S atoms on the surface bonded only As atoms. STM observation revealed that S atoms had a periodicity of 4 Å corresponding to that of Ga or As atoms in the (100) plane.
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