Abstract
The flux of atomic oxygen generated in an electron cyclotron resonance microwave plasma source was quantified by two different methods. The commonly applied approach of monitoring the frequency change of a silver-coated quartz crystal microbalance (QCM) deposition rate monitor as the silver is oxidized was found to underestimate the atomic oxygen flux by an order of magnitude compared to a more direct deposition approach. In the mixed-phase Ag/Ag 2O deposition method, silver films were deposited in the presence of atomic oxygen such that the films were partially oxidized to Ag 2O; X-ray photoelectron spectroscopy was utilized for quantification of the oxidized fraction. The inaccuracy of the QCM oxidation method was tentatively attributed to efficient catalytic recombination of O atoms on the silver surface.
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