Abstract
AbstractThe paper shows the importance of soft X‐ray reflection spectroscopy as a non‐destructive in‐depth characterization tool for the middle atomic ordering in TiO2 thin films. The microstructure of TiO2 films synthesized by magnetron sputtering on Si(100) wafers was characterized by X‐ray reflection spectroscopy (XRS), X‐ray Diffraction (XRD) method and X‐ray reflectometry (XRR). Reflection spectra and calculated absorption spectra were analyzed in the vicinity of Ti L2,3 and O K absorption edges. It was established that the 70 nm TiO2 film is polycrystalline with an anatase structure and homogeneous in depth. The 10 nm TiO2 film is amorphous. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
