Abstract
We report fabrication of smooth Al-doped ZnO (AZO) films <100 nm by atomic layer deposition (ALD) with epsilon-near-zero (ENZ) frequencies in the near-infrared region controlled by deposition parameters. Excitation of the ENZ plasmon-polariton mode in the AZO films is experimentally demonstrated. The ALD growth of smooth ultra-thin AZO nanolayers with tunable ENZ frequency enables the development of ultra-compact and tunable metamaterial devices and flat nonlinear/quantum zero-index optics.
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