Atomic layer deposition of functional multicomponent oxides

Mariona Coll,Mari Napari

doi:10.1063/1.5113656

Abstract

Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces. This will enable the investigation of novel phenomena and development of new devices and applications. Atomic layer deposition (ALD) has flourished over the last decades in fabrication of conformal thin films and nanostructures with atomic-scale control. Nonetheless, the scenario of deposition of complex oxides with desired properties has proven to be challenging. In this article, we scrutinize the basics of the precursor and process design for ALD followed by a review on the major achievements in the synthesis of doped and complex oxides identifying several relevant examples that are foreseen to have direct technological applications. Finally, current challenges and perspectives on ALD complex oxides are given.

Highlights

Complex oxides are a fascinating family of materials, finding technological applications in a broad variety of fields ranging from microelectronics and nanoelectronics to catalysis and energy conversion and storage, among others
We have reviewed the rapid progress on atomic layer deposited multicomponent oxides from doped to complex oxides focusing on single perovskite, spinel, delafossite, and scheelite structures and highlighting their potential technological applications
Superior film conformality and compatibility with the stateof-the art manufacturing processes have already made Atomic layer deposition (ALD) one of the most rapidly developing fields in the microelectronics industry, and ALD has proven itself as a key technology in the downscaling of novel logic and memory components

Summary

INTRODUCTION

Complex oxides are a fascinating family of materials, finding technological applications in a broad variety of fields ranging from microelectronics and nanoelectronics to catalysis and energy conversion and storage, among others. Scitation.org/journal/apm to study the novel physics arising at the oxide interfaces.[8] This technique is already integrated in the semiconductor industry, and it is finding crucial applications in other fields such as photovoltaics,[9,10] organic electronics,[11] catalysis,[12] and energy storage.[13,14] Being a surface-limited deposition method, the deposition area is not restricted by a line-of-sight, and batch processes are possible, and, in principle, the size of the substrates is limited only by the volume of the deposition chamber New technologies such as spatial[15] and roll to roll ALD16 have been a breakthrough in manufacturing, allowing faster deposition rates even on flexible substrates. We summarize some of the current challenges and future directions in this field

Precursors for complex oxides

Synthesis of complex oxides by ALD

Doped oxides

Complex oxides

Findings

CONCLUSIONS AND FUTURE PROSPECTS