Atomic layer deposition of crystalline Bi2O3thin films and their conversion into Bi2S3by thermal vapor sulfurization

Abstract

Download options Please wait... Supplementary files Supplementary information PDF (1475K) Article information DOI https://doi.org/10.1039/C4RA09896J Article type Paper Submitted 05 Sep 2014 Accepted 22 Oct 2014 First published 22 Oct 2014 Download Citation RSC Adv., 2014,4, 58724-58731 BibTex EndNote MEDLINE ProCite ReferenceManager RefWorks RIS Permissions Request permissions Atomic layer deposition of crystalline Bi2O3 thin films and their conversion into Bi2S3 by thermal vapor sulfurization H. F. Liu, K. K. A. Antwi, Y. D. Wang, L. T. Ong, S. J. Chua and D. Z. Chi, RSC Adv., 2014, 4, 58724 DOI: 10.1039/C4RA09896J To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page. If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given. If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page. Read more about how to correctly acknowledge RSC content. Social activity Tweet Share Search articles by author H. F. Liu K. K. Ansah Antwi Y. D. Wang L. T. Ong S. J. Chua D. Z. Chi