Atomic layer deposition of aluminum-free silica onto patterned carbon nanotube forests in the preparation of microfabricated thin-layer chromatography plates

Abstract

We describe the direct, conformal, atomic layer deposition (ALD) of silica onto carbon nanotubes (CNTs) in the microfabrication of thinlayer chromatography (TLC) plates. As before, these plates were prepared with zig-zag hedge and channel microstructures, with high aspect ratio, porous hedges. After ALD, scanning electron microscopy (SEM) showed an increase in the radius of the CNTs of 8–40 nm. X-ray photoelectron spectroscopy (XPS) showed that the plates were composed almost entirely of silicon and oxygen, without contamination of metals or other elements that might compromise chromatographic performance, e.g., aluminum. Time-of-flight secondary ion mass spectrometry confirmed the extremely low level of aluminum in the plates. The final TLC layer thickness was ca. 50 μm. Separations of a test mixture of dyes from CAMAG (Muttenz, Switzerland) on an uncoated silica plate under traditional, normal phase conditions gave efficiencies of 40,000–140,000 plates m−1 with migration distances ranging from 2 to 36 m...