Abstract
This study presents the comparison of microstructure, mechanical, tribological, and optical properties of the ternary chromium-aluminum oxide films ((Cr1-xAlx)2O3) with binary Cr2O3 and Al2O3 films, deposited by atomic layer deposition at 275 °C. The atomic growth per cycle of the Al atoms increased from 3.1 to 8.5 atoms/nm2 on chromium oxide film. The Al2O3 films were X-ray amorphous. The Cr2O3 films contained crystallites of the eskolaite phase. Nano-size (diameter from 3 to 5 nm) crystallites with cubic symmetry and matching with that of cubic γ-Al2O3 or η-Al2O3 phases were observed in (Cr1-xAlx)2O3 films. The ternary film with Al/(Al + Cr) of 0.40 showed the highest hardness (18.4 GPa) and elastic modulus (169.4 GPa), whereas the wear rate of this film decreased by ∼80 % compared with Cr2O3 films. Optical band gap energy values corresponding to the indirect transition model decreased from 2.93 eV for the Cr2O3 film to 2.58 eV for the Cr-Al-O films.
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