Abstract
The traveling-wave reactor is an effective instrument for performing atomic layer deposition (ALD). In this paper, the use of a Brewster-angle interferometric reflectance technique for in situ real-time monitoring of ALD growth of transparent thin films on transparent and non-transparent substrates in suited traveling-wave reactors is proposed and analyzed on the basis of a classical four-phase approximation. An appropriate experimental reactor system is described. The technique is applied to the diagnostics of TiO 2 growth from TiCl 4 and H 2O. Features of the reflectance signal in the conditions of time-homogeneous ALD growth are discussed.
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