Abstract
The first stages of diamond growth on scratched silicon substrates were studied by atomic force microscopy (AFM). Samples were obtained by both hot filament and microwave plasma CVD methods at short deposition times prior to coalescence. It was observed that, after an incubation time, diamond nanocrystals nucleated onto the scratches produced by diamond paste polishing. The Raman spectra of the crystals showed different bands associated with several carbon phases. Simultaneous with diamond growth, we detected an etching effect of the silicon surface attributed to the atomic hydrogen present in the activated gas.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
