Atomic-force-microscopy nanowriting on ultrathin tetrahedral amorphous carbon films

Abstract

We report the atomic-force-microscopy (AFM)-based nanolithography writing of surface patterns on ultrathin ( 4 V, and (3) the contact pressures in the GPa range results in the formation of a novel carbon phase in a nm-thick surface layer characterized by the lower density, lower mechanical strength, lower electrical conductivity, and increased nanofriction as compared to the original film. The structure of the tip-modified nm-thick layer on the ta-C film is assumed to be a structure of graphite oxide which can be further modified in the presence of water under high contact pressures.