Abstract
We have developed a new type AFM (Atomic force microscopy) for semiconductor wafer testing with coarse-fine movement mechanisms, coarse XY stage and fine xy scanner. XY scanner was used both sample positioning and AFM scanning, A unique birds-beak type z-scanner was designed to be constructed with an optical microscope. Firstly we examined basic characteristics of each positioning mechanisms, 20 mm positioning with coarse-fine control in 0.25 s, 2 nm step moving with xy scanner. Secondary the resolution of the AFM system with 0.3 nm and the frequency response with 1 kHz in AFM operation were measured. Finally as AFM observations, a compact disc surface and bare-Si surface of 0.19 nm Ra were clearly measured. We confirmed the usefulness of the new AFM mechanism.
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