Abstract
AbstractInterest in room-temperature operable quantum effect devices has created a need for simple and inexpensive nanofabrication techniques. By applying a bias to a conductive AFM tip, we have succeeded in fabricating narrow (˜30 nm) oxide lines on a variety of metal and III-V semiconductor substrates. The effects of different drawing parameters such as tip bias, translation speed, ambient atmosphere, and substrate doping on line quality were explored.
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