Abstract

Controllable synthesis of single atom catalysts (SACs) with high loading remains challenging due to the aggregation tendency of metal atoms as the surface coverage increases. Here we report the synthesis of graphene supported cobalt SACs (Co1/G) with a tuneable high loading by atomic layer deposition. Ozone treatment of the graphene support not only eliminates the undesirable ligands of the pre-deposited metal precursors, but also regenerates active sites for the precise tuning of the density of Co atoms. The Co1/G SACs also demonstrate exceptional activity and high selectivity for the hydrogenation of nitroarenes to produce azoxy aromatic compounds, attributable to the formation of a coordinatively unsaturated and positively charged catalytically active center (Co–O–C) arising from the proximal-atom induced partial depletion of the 3d Co orbitals. Our findings pave the way for the precise engineering of the metal loading in a variety of SACs for superior catalytic activities.

Highlights

  • Controllable synthesis of single atom catalysts (SACs) with high loading remains challenging due to the aggregation tendency of metal atoms as the surface coverage increases

  • We have devised a reliable method via the atomic layer deposition (ALD) technique for the preparation of stable high loading Co1/G SACs, which allows the precise tuning of the density of isolated Co atoms on the graphene support

  • In our study, reduced graphene oxide was selected as the support for the preparation of Co1/G SACs due to the following figures of merit: (i) chemically derived graphene offers an ideal low-cost platform for the anchoring of individual Co ALD precursors to the oxygen-decorated carbon sites;[32] (ii) the density of anchoring sites on graphene can be tuned by controlling the pretreatment conditions[32,33,34]

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Summary

Introduction

Controllable synthesis of single atom catalysts (SACs) with high loading remains challenging due to the aggregation tendency of metal atoms as the surface coverage increases. We have devised a reliable method via the atomic layer deposition (ALD) technique for the preparation of stable high loading Co1/G SACs, which allows the precise tuning of the density of isolated Co atoms on the graphene support.

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