Atom doping in α-Fe2O3 thin films to prevent hydrogen permeation

Abstract

Prevention of hydrogen (H) penetration into passive films and steels plays a vital role in lowering hydrogen damage. This work reports effects of atom (Al, Cr, or Ni) doping on hydrogen adsorption on the α-Fe2O3 (001) thin films and permeation into the films based on density functional theory. We found that the H2 molecule prefers to dissociate on the surface of pure α-Fe2O3 thin film with adsorption energy of −1.18 eV. Doping Al or Cr atoms in the subsurface of α-Fe2O3 (001) films can reduce the adsorption energy by 0.03 eV (Al) or 0.09 eV (Cr) for H surface adsorption. In contrast, Ni doping substantially enhances the H adsorption energy by 1.08 eV. As H permeates into the subsurface of the film, H occupies the octahedral interstitial site and forms chemical bond with an O atom. Comparing with H subsurface absorption in the pure film, the absorption energy decreases by 0.01–0.22 eV for the Al- and Cr-doped films, whereas increases by 0.82–0.96 eV for the Ni-doped film. These results suggest that doping Al or Cr prevents H adsorption on the surface or permeation into the passive film, which effectively reduces the possibility of hydrogen embrittlement of the underlying steel.