Abstract
Sinusoidal grid with nanometric precision is adopted as a surface encoder to measure multiple degree-of-freedom motions. This paper proposes the atmospheric pressure plasma processing (APPP) technique to fabricate an optical sinusoidal grid surface. The characteristics of removal function and surface generation mechanism are firstly presented. Both simulation and experiment validate the effectiveness of APPP to fabricate a sinusoidal grid surface with nanometric precision. Post mechanical polishing experiments show that APPP features can be well maintained while the surface roughness is greatly reduced to meet the optical requirement.
Highlights
As an innovative surface encoder, a sinusoidal grid has been successfully adopted to measureAs an innovative surface encoder, a sinusoidal grid has been successfully adopted to measure multiple degree-of-freedom translational and tilt motions of precision stages [1,2,3]
The results showed that the removal rate of plasma chemical vaporization machining (CVM) could be equal to that of precision grinding, while the roughness of the processed surfaces was the same as that of the polished surfaces
Atomic force microscopy (AFM) was used for to Ra 3.5 nm, which is similar to the surface roughness after Single-point diamond turning (SPDT)
Summary
As an innovative surface encoder, a sinusoidal grid has been successfully adopted to measure multiple degree-of-freedom translational and tilt motions of precision stages [1,2,3]. As the translational reference of a multiple degree-of-freedom encoder, the sinusoidal grid is preferred with form accuracy in nanometric level, in order to guarantee the encoder functional performance. Optical sinusoidal grid surfaces can be used in the generation of multiple degree-of-freedom encoders. Atmospheric pressure plasma processing (APPP) is a promising technique in optical fabrication because of its deterministic high material removal rate and non-contact removal mechanism. The controllable Gaussian-shape removal function makes APPP potential to generate structured and freeform surfaces with nanometric form accuracy and high efficiency. APPP technique is proposed to fabricate optical sinusoidal grid surface (fused silica material). The experimental APPP with post mechanical polishing is carried out to validate the effectiveness to fabricate an optical sinusoidal grid surface
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
