Abstract
This study explored the utilization of an atmospheric pressure plasma jet (APPJ) for the deposition of metal layers, employing Ar + 2 % H2 as the working gas. The research focuses on three distinct metals - silver (Ag), copper (Cu), and nickel (Ni). Through the application of optical emission spectroscopy, significant peaks of Ar-related and hydrogen-alpha (Hα) species are observed, accompanied by atomic characteristic emission lines specific to Ag, Cu, and Ni, respectively. The XRD examination indicates the successful deposition of metal layers onto the substrates, a confirmation supported by the EDS line scan. Examination of the surface morphology reveals that the metal particles have clustered together, creating a porous structure. The resistivity measurement obtains the values of 5.18, 3.81, and 9.21 μΩ-cm for Ag, Cu, and Ni layers, respectively. Moreover, the paper presents a proposed mechanism for depositing metallic conductive layers using an atmospheric pressure plasma jet (APPJ), elucidating the complex processes inherent in this novel technique.
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