Abstract
Deposition of electrochromic organonickel oxide (NiOxCy) films onto glass/indium tin oxide (ITO) substrates using atmospheric-pressure plasma-enhanced chemical vapor deposition with an atmospheric pressure plasma jet under various precursor injection angles is investigated. A precursor [nickelocene, Ni(C5H5)2] vapor, carried by argon gas and mixed with oxygen gas, is injected into an air plasma torch for the deposition of NiOxCy films by a short exposure of the substrate, 20s, in the plasma. Uniform light modulation on glass/ITO/NiOxCy is produced while the moving glass/ITO substrate is exposed to the plasma torch at room temperature (~23°C) and under atmospheric pressure. Light modulation with up to a 40.9% transmittance variation at a wavelength of 513.9nm under Li+ intercalation and de-intercalation in a 1M LiClO4–propylene carbonate electrolyte is achieved.
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