Abstract
In this study, bismuth oxide powder (Bi2O3) was deposited by an atmospheric pressure plasma jet onto borosilicate glass. The layer produced through this method is to be used as a photo catalyst in later applications. The deposited coating was analyzed by X-ray diffraction (XRD) to determine the crystal structure, and X-ray photoelectron spectroscopy (XPS) to analyze the chemical state. The results showed a change in crystal and chemical structure during the deposition process. The morphological properties of the layer were examined with scanning electron microscopy (SEM) and laser scanning microscopy (LSM). The band gap structure of the coating was investigated by UV-Vis spectroscopy. The layer produced by the plasma spraying process consisted of circular multi-phase bismuth oxide droplets (monoclinic Bi2O3 and tetragonal Bi2O2.33), showing a direct band gap of Eg = 2.72 eV, which allows their use as a photocatalyst.
Highlights
Bismuth oxide is an important semiconductor that has special properties such as a wide energy band gap [1], high refractive index [2] and dielectric permittivity [3]
The deposited coating was analyzed by X-ray diffraction (XRD) to determine the crystal structure, and X-ray photoelectron spectroscopy (XPS) to analyze the chemical state
The results showed a change in crystal and chemical structure during the deposition process
Summary
Bismuth oxide is an important semiconductor that has special properties such as a wide energy band gap [1], high refractive index [2] and dielectric permittivity [3]. These properties make bismuth oxide suitable for use as a visible light photocatalyst [4], optical coatings [5], electrochromic material [6]. As a sensor material [7] In these applications, bismuth oxide is in the crystalline phase. In addition to the seven phases, two other nonstoichiometric phases are known, Bi2 O2.75 and Bi2 O2.33 [14]
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