Abstract
The atmospheric pressure chemical vapor deposition (APCVD) of SiO2–TiO2 thin films on glass by employing a [[(tBuO)3SiO]2–Ti(OiPr)2] single-source precursor, which can be prepared from commercially available materials, results in antireflective thin films with high silica SiO2 : TiO2 ratio (i.e. SiO2 > 1) on float glass under industrially relevant manufacturing conditions.
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