Abstract
We have proposed a new photoassisted chemical vapor deposition (photo-CVD) process of Si, in which only a hydrogen carrier gas is excited by UV light from low-pressure Hg lamps and a reactant gas of SiH2Cl2 is not irradiated at all. In this type of photo-CVD, it is found that (1) the number of pyramidal hillocks on orientation-just surfaces is drastically suppressed, (2) the number of etch pits, corresponding to the stacking fault and the precipitation of contaminants, is also decreased, (3) the growth rate is significantly enhanced, and (4) the surface roughness is decreased. In particular it should be emphasized that these effects are more apparent at atmospheric pressure. It is suggested that the UV-light irradiated hydrogen plays an important role in removing chlorine atoms adsorbed on the surface.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.