Asymmetry-Induced Redistribution in Sn(IV)–Ti(IV) Hetero-Bimetallic Alkoxide Precursors and Its Impact on Thin-Film Deposition by Metal–Organic Chemical Vapor Deposition

Shashank Mishra,Elisabeth Blanquet,Deobrat Singh,Catherine Marichy,Erwann Jeanneau,Stéphane Daniele,Rajeev Ahuja,Ioana Nuta,Liang Tian

doi:10.1021/acs.cgd.1c01136

Asymmetry-Induced Redistribution in Sn(IV)–Ti(IV) Hetero-Bimetallic Alkoxide Precursors and Its Impact on Thin-Film Deposition by Metal–Organic Chemical Vapor Deposition

Shashank Mishra, Elisabeth Blanquet + Show 7 more

Open Access

https://doi.org/10.1021/acs.cgd.1c01136

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Journal: Crystal Growth & Design	Publication Date: Dec 2, 2021
Citations: 1

Affiliation: Institute of Researches on Catalysis and Environment in Lyon, Claude Bernard University Lyon 1, Université Grenoble Alpes, Science et Ingénierie des Matériaux et Procédés, Uppsala University, Laboratoire des Multimatériaux et Interfaces, French National Centre for Scientific Research, Indian Institute of Technology Ropar

#Metal Organic Chemical Vapor Deposition #Thin-Film Deposition + Show 6 more

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With an aim to enhance the stability and volatility of the heterometallic derivative [SnCl4(μ-OEt)2Ti(OEt)2(HOEt)2] (A), obtained conveniently and quantitatively as a simple adduct formula from the...

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