Abstract
The computation of asymmetry aberrations in electron-beam focusing and deflection system is discussed. The aberrations caused by the asymmetry errors (misalignment, tilt, and ellipticity) in magnetic and electrostatic defectors are especially emphasized. First, the method for evaluating the perturbations of electrostatic and magnetic fields due to the asymmetry errors are described; then the formulas for computing the asymmetry aberration coefficients are derived. A set of computer programs based on this paper and also our previous work [X. Zhu and H. Liu, in Proceedings of the International Symposium on Electron Optics, Beijing, 1986 (Institute of Electronics, Academia Sinica, Beijing, 1987), p. 309; E. Munro, J. Vac. Sci. Technol. B 6, 941 (1988); and H. Liu and X. Zhu, Optik 84, 123 (1990)] has been developed, which can handle the tolerancing of complete columns containing any combination of electrostatic and magnetic lenses and deflectors, such as are required for electron-beam lithography and inspection systems.
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