Abstract
In this paper, insulated shallow extension cylindrical surrounding gate (ISE-CSG) MOSFET with high-k gate stack has been proposed and extensively investigated. The performance of high-k ISE-CSG MOSFET has been compared with cylindrical surrounding gate MOSFET. ISE-CSG with high-k gate stack has number of desirable features at 30 nm regimes. The results reveal that ISE-CSG MOSFET with gate stack is more immune to short channel effects because of improved carrier transportation capability. It has been observed that high-k ISE-CSG MOSFET shows improved figure of merits as drive current (ION), ION/IOFF ratio, transconductance (gm), cutoff frequency fT, transconductance generation factor, intrinsic gain (Av), transconductance frequency product, gain transconductance frequency product and gain frequency product. ISE-CSG with high-k gives better control over the depletion region and therefore it is a suitable device for high speed, high frequency and analog/RF circuit applications.
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