Abstract
The fabrication of patterned quantum dot (QD) films is of great importance for color displays based on photo-emissive color conversion. In this work, a novel and precise alignment-free fabrication method of patterned quantum dot color conversion (QDCC) films was proposed by introducing into aspiration-assisted lithography. QDs dispersed in mixed polymer/toluene solvent can be imbibed via predetermined micro-channels with the assist of aspiration. The results show that uniform QDCC films with multicolor QDs could be achieved by adjusting the polymer/toluene ratios and the aspiration time. Superfine QD patterns with a width of around 8 μm could also be obtained by varying the interfacial free energies of substrates. A color conversion device using a turquoise OLED and the QDCC films incorporated with distributed Bragg reflector have been demonstrated, exhibiting a conversion efficiency up to 23.27%.
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