Abstract
Diamond was deposited onto SiAlON substrates by glow-discharge-activated chemical vapor deposition (CVD) using hydrogen-methane gas mixtures. The formation of diamond depends strongly on the plasma parameters (current, voltage, pressure, gas mixture) and the substrates used. Diamond deposition occurred in a d.c. glow discharge at a pressure of 30 mbar, a voltage of 660 V and current density of 0.5 A cm 2, and a series of bright and dark striations in the Faraday dark space was observed. As the presence of illumination in the interelectrode space is apparently important for successful diamond deposition, its dependence on the various luminous effects, and the voltage distribution in the interelectrode space are discussed.
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