Arsenic and Nickel Stress Response, Their Bioremediation Potential and Mechanism of Trichoderma lixii Isolated from Electroplating Wastewater

Abstract

In this investigation, arsenic (As) and nickel (Ni) removal ability of fungus Trichoderma lixii CR700 have been explored. During the batch study, it showed efficient removal ability for As and Ni which was 94.7 and 68% respectively at 10 mgL−1 and 144 h after incubation, however, increasing concentration from 10 to 500 mgL−1 of As/Ni affected the removal ability of the fungus. The optimum pH, temperature and time for removal of As and Ni were 8.0, 28 °C and 240 h after inoculation. T. lixii CR700 also exhibited significant removal ability under the presence of salts, anions, EDTA and heavy metals. As and Ni removal was mainly happened by accumulation, where glutathione and thiol content might be played an important role in addition to surface sorption mechanism as confirmed from FTIR. T. lixii CR700 showed multifarious morphological and biochemical responses to deal As and Ni toxicity. Toxicity potential of fungal treated solution of As/Ni was diminished as confirmed from superior growth and high germination rate of Vigna radiata seeds in fungus treated As/Ni solution. Therefore, T. lixii CR700 can be potentially exploited for the management of As/Ni polluted aqueous system in safe and sustainable way.