Abstract
We present a novel experiment of generating multiple, pulsed indium atomic beams with sub-micron periodicity via rear side ablation of thin film by multiple beam interferometer using high power Q-switched Nd:YAG laser under high vacuum (∼10 −5 Torr) for the first time. The applications of these atomic beams in atom lithography using dipole force as well as in direct deposition lithographic technique are discussed.
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