Abstract
We demonstrate that temperature programmed desorption (TPD) of argon is a sensitive and non-destructive probe to study the properties of an underlying substrate: the desorption temperatures of the first argon layer from the clean Ni(111) surface, the saturated chemisorbed benzene layer, the first physisorbed benzene layer (on top of chemisorbed benzene) and thicker physisorbed benzene layers on Ni(111) are determined to 39.0, 43.5, 36.5 and 30–32 K, respectively. We have applied argon desorption to investigate the initial growth behavior of physisorbed benzene layers on top of the chemisorbed (√7 × √7)R19.1 benzene layer on Ni(111): the argon TPD spectra show that the growth mode of the first physisorbed benzene layers strongly depends on adsorption temperature and on the number of defects in the chemisorbed layer.
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