Abstract
AbstractOnly one weak point of all aromatic group polyimide surface was changed to water repellency. Polyimide surface was photo-chemically modified to be fluorinate with ArF excimer laser and Xe2 · excimer lamp irradiation. To promote the photo- chemical reaction, Xe2· excimer lamp was employed to produce CFn. radical from CF4 gas. Simultaneously, ArF excimer laser was irradiated on the polyimide surface to dissociate C-H bond. Dangling bond of C was reacted with CF, radical and produced C-CF, on the polyimide surface. By this modification, polyimide surface was changed to water repellency. As a result, polyimide surface was photo-chemically modified to fluorinate with CF4 gas pressure of 100Torr, the Xe2 excimer lamp of 7mW/cm2, and the ArF excimer laser of 30mJ/cm2, 10Hz and 3000shots, the contact angle with water was 134 degrees. And chemical composition of the photo-modified polyimide surface was inspected by ATR-FTIR spectra measurement.
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