Area-selective growth of aligned single-walled carbon nanotube films using microwave plasma-enhanced CVD

Abstract

The synthesis of dense, aligned carbon nanotubes (CNTs) on an Si substrate was achieved using microwave plasma-enhanced chemical vapor deposition. Catalytic nanoparticles were prepared on the Si substrate without a buffer layer, using pulsed arc plasma deposition, with a sintered Co and Ti composite electrode. Mixing Ti nanoparticles with Co nanoparticles prevents the formation of Co-silicides during the substrate heating process, thereby enabling fabrication of single-walled carbon nanotubes (SWNTs). In addition, catalytic nanoparticles were patterned using a lift-off method, and area-selective growth of vertical SWNTs to form organized SWNT microstructures was demonstrated.