Architecture design and applications of nanopatterned arrays based on colloidal lithography

Abstract

Nanopatterned arrays have potential applications in diverse devices, including high-density memory, wettability control, electronic chips, biochips, plasmonics (such as plasmon sensors, plasmon-enhanced molecular spectroscopy, and plasmon-mediated chemical reactions), and so on. In this tutorial, we first introduce colloidal lithography (CL) technique as an important method to prepare nanopatterned arrays. Based on the formation of a mask by self-assembly of polystyrene (PS) colloid spheres, the nanopatterned arrays can be achieved by following a series of various deposition, etching, transfer, and their combination steps. According to the structural differences of the acquired surface patterns, diverse nanopatterned arrays are fabricated by controlling the fabrication routes. Technical issues are discussed in detail, such as preparation and modification of the large-area and ordered PS colloid sphere arrays and design and hybridization of nanostructured arrays of films with various shapes. In the meantime, the potential applications of these nanopatterned array films are reviewed and summarized. Hopefully, the present tutorial will inspire more ingenious designs of nanopatterned arrays and developments of using CL technique in potential applications.