Abstract

Mixture control chart patterns (CCPs) mixed by two types of basic CCPs together usually exist in the real manufacture process. However, most existing studies are considered to recognize the single abnormal CCPs. This study utilizes independent component analysis (ICA) and support vector machine (SVM) for recognizing mixture CCPs recognition in a process. The proposed scheme, firstly, uses ICA to the monitoring process data containing mixture patterns for generating independent components (ICs). The undetectable basic patterns of the mixture patterns can be revealed in the estimated ICs. The ICs are then used as the input variables of the SVM for building CCP recognition model. Experimental results revealed that the proposed scheme is promising for recognizing mixture control chart patterns in a process.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.