Abstract
Atomic Layer Deposition (ALD) is a promising technique to precisely deposit nanometer-thick films on inorganic and organic substrates. ALD is known for the deposition of uniform, conformal, and pinhole-free thin films with a controllable thickness with sequential and self-limiting gaseous reactions on the substrate surface of interest. ALD thin films have a wide range of applications, from semiconductor industries to medical devices. In many studies, ALD thin films are used to modify the biomaterial surface properties for particular biomedical applications. Here, polymethyl methacrylate, titanium-based alloys, and collagen were chosen as substrates for this review; thanks to their biocompatibility, these substrates have several applications in the dental, medical, and biomedical fields. The ALD of Titanium (IV) oxide (TiO2) films has been selected for this review as a biocompatible material which has attracted increasing attention in biomedical applications. Selected publications focusing on the modification of the surface of these biomaterials with TiO2 ALD are discussed.
Highlights
Atomic layer deposition (ALD) is a vapor-phase technique to deposit thin films of metals, oxides, sulfides, nitrides, and metalorganic frameworks (MOF) on various substrates [1,2,3]
Thermal ALD occurs through surface chemical reactions, while in Plasma Enhanced ALD (PE-ALD), the substrate is exposed to plasma discharge, energetic ions, and bombarded electrons; Radical Enhanced ALD (RE-ALD) is a process similar to PE-ALD except that the substrate is exposed to radicals [5]
PE-ALD and RE-ALD are preferable for heat-sensitive biomaterials because they can be performed at lower temperatures compared to thermal ALD; thermal ALD would generally result in higher conformity and there is no likely damage to the substrates during plasma pulses as it is plausible in PE-ALD [3]
Summary
Atomic layer deposition (ALD) is a vapor-phase technique to deposit thin films of metals, oxides, sulfides, nitrides, and metalorganic frameworks (MOF) on various substrates [1,2,3]. ALD has attracted much attention to modify and functionalize the surface of biomaterials and biomedical implants due to its sequential exposure to the reactants which allows conformal deposition of inorganic materials onto organic and metal substrates.
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