Abstract
We report the implementation of a generic faceted-mirror simulation utility in SHADOW. This extension is suitable for the design of mirror arrays such as those for synchrotron-radiation-based full-field X-ray lithography illuminators. As a demonstration, we propose in this paper a practical two-mirror design that can create a uniform 55 mm × 50 mm illumination region at the X-ray mask plane. We also discuss the effect of multiple mirrors on the partial coherence of the system, and its effect on image formation.
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