Abstract
Surface treatments of organic materials such as wool fabric and polymer films were done by glow plasma in two types of discharge systems at atmospheric pressure using He and Ar as carrier gases.Wool fabric was treated by C3F6/He plasma using a parallel plate-type reactor. On the fabric surface, fluorinated polymer was deposited. The surface has a high value of oil contact angle, so it retained anti-shrinking effect of wool fabrics even after repeated washing in water. Surface cleaning of organic contamination on a silicon wafer was done by after glow plasma in an atmospheric ambience using a new spray-type discharge reactor. Ashing (cleaning) rate was strongly dependent on the gas flow rate of O2/Ar gas and on the concentration of O2.
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