Abstract
Abstract AZ RAYPO, an image reversal resist operating via an acid- catalysed thermal cross-linking mechanism, has been evaluated with respect to resolution, dose and focus latitudes, thermal stability and etch resistance. The experiments using high numerical aperture g- and i-line steppers for the imaging exposure confirmed suitability for both exposure wave- lenghts as suggested by spectroscopic data. Preliminary tests using topography wafers demonstrated resolution of minimum dimensions down to 0.55 μm.
Published Version
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