Abstract
Time statistics for successive breakdown (BD) events in Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> /HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> -based nanolaminates aimed to the development of multilevel one-time programmable (OTP) memory cells is investigated. The clustering model is shown to account for the departure of the experimental data from the standard Weibull model attributed to the initial leakage current dispersion. An equivalent electrical circuit model is used to represent the stepwise current increase triggered by the appearance of multiple BD sites. Correlation effects in the order statistics are ascribed to a reduction of the effective stress voltage caused by the presence of a series resistance. It is shown that the E-model acceleration law for dielectric BD is consistent with the data obtained from our antifuse cells.
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