Abstract
This paper reports the variation of track registration sensitivity as a function of the stopping power of heavy ions in UPILEX-S® films, which is known as the most radiation tolerant polyimide (PI). The detection thresholds in the stopping power for etch pit formation are determined as 4,000, 4,100, 4,800, and 5600 keV/μm for 40Ar, 84Kr, 132Xe and 238U ions, respectively. Furthermore, we investigate the latent track structure in two kinds of PI films (UPILEX-S® and Kapton) by means of FT-IR spectroscopy. At the similar stopping power value, the radiation chemical yields (G value) for heavier ions are lower than those of lighter ions. This is due to the difference of the radial dose distribution for low and high velocity ions.
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