Abstract
The thermal plasma processing for ceramics was surveyed with a stress on plasma spraying, plasma CVD and plasma sintering. The development of the low pressure plasma process and RF plasma process in plasma spraying is worth of special mention. These processes will be applied to ceramics coating in near future. Researches on thermal CVD are being carried out very actively for synthesis of high purity ultra fine ceramic powders such as silicon nitride and silicon carbide. This process has a very high potential as a means for rapid growth of ceramic films on various substrates. Low pressure RF inductive plasma and high power microwave plasma have characteristics quite different from RF glow discharge plasma. It is very interesting that these plasmas are applied to synthesize diamond and cubic boron nitride films. Rapid sintering of ceramic powders in plasma atmosphere is one of the most important applications of plasma to materials processing, but many problems remain to be solved in the sintering process.
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