Abstract
Abstract Currently, scientists are striving to produce innovative textile materials characterized by special properties. Therefore, attempts have been made to use physical and chemical vapor deposition techniques to modify the surface of textile materials, i.e., nonwovens, fabrics, and knitted fabrics. By using these techniques for modifying the basic materials, researchers have obtained textiles with novel properties, which are used in shielding materials, textronics, or clothing, as well as in specialized accessories. The PVD process can be applied for almost all materials. The physical vapor deposition process allows for obtaining layers of different thicknesses and with various physical and chemical properties. This article is a review of the latest state of the art on the use of various methods of physical vapor deposition in textiles destined for different purposes.
Highlights
Progress in the areas of manufacturing and increasing the service life of both structural elements and tools applicable in many areas of life is possible owing to the use of thin layer coating techniques, very often, of hard and wear-resistant ceramics
- Reactive magnetron sputtering (RMS) method – this method involves atomization of the material that is the substrate of the obtained coating, by the gas ions formed in the area between the plasma and the charge
The development of new technologies and the combining of scientific disciplines allows for the manufacture of new innovative textile materials
Summary
Progress in the areas of manufacturing and increasing the service life of both structural elements and tools applicable in many areas of life is possible owing to the use of thin layer coating techniques, very often, of hard and wear-resistant ceramics. The spraying process is used to apply coatings of significant technological importance This process involves applying a chemical compound or metal in the vapor form with a high degree of ionization by atomizing a target (cathode), which is made of material deposited by using an ion stream of an inert gas, which is generally argon. - Reactive magnetron sputtering (RMS) method – this method involves atomization of the material that is the substrate of the obtained coating, by the gas ions formed in the area between the plasma and the charge. - Reactive ion planting (RIP) methods - this method involves reactive sputtering, consisting of melting and evaporation of metals as a result of the use of high-voltage electron guns during the glow discharge occurring around a negatively polarized substrate
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